Hệ thống phân tích UHV trung tính, gốc tự do và ion

EPIC / EPIC 1000 Series

A system for UHV analysis of neutrals, radicals and ions

9 ₫

Model: EPIC / EPIC 1000 Series
Manufacturer: Hiden Analytical

The Hiden EPIC system is designed for analysis of neutrals, radicals and ions. Based on the RC7 Plasma/SIMS interface PC-driven control system, the EPIC analyser head is the entry-level unit to the science-application Plasma/SIMS series.

Applications

Surface science
Thin film & surface engineering
Catalysis
Molecular beam studies
Cluster studies

Category: Uncategorized

The EPIC system is factory-upgradeable for the inclusion of an energy-filter, either the Bessel box or 45 degree sector field type, ensuring compatibility with the Hiden plasma/SIMS series including the EQP, EQS, PSM and SIM probes.

Features

Pulse Ion Counting detector for positive and negative ion detection.
‘Low-profile’ ion source. Desorbing surfaces may be positioned to within 8 mm of the ionisation region
Wide dynamic range. 7 decade continuous log scale, and up to 5 x 1010 with Faraday option.
High sensitivity. Detection levels to 5 x 10-15 mbar.
Fast data acquisition. Up to 650 measurements per second.
Ion source control for soft ionisation and appearance potential mass spectrometry.
DMM-dynamic multi-mode scanning- uniquely applied for to the electron attachment ionization technique for electronegative gas studies
Gating input for pulsed gas studies with down to 0.1 µsecond gating resolution.

Mass Range	1:50 amu , 1:300 amu, 2:510 amu, 2:1000 amu, or 10:2500 amu.
Maximum Operating Pressure	5 x 10-6 mbar. 1 x 10-4 mbar with Faraday option
Resolution
50 amu system	0.1% Valley between adjacent peaks of equal height throughout the mass range.
300/510 amu systems	1 % Valley between adjacent peaks of equal height throughout the mass range.
1000 amu systems	10% Valley between adjacent peaks of equal height throughout the mass range.
2500 amu systems	10% Valley between adjacent peaks of equal height to 1000 amu, peak width at 2500 amu is 4 amu. Software adjustable for high resolution applications.
Abundance Sensitivity	0.1 part per million
Detector	Fast pulse counting detector, positive and negative ion
Dynamic Range	From 1 count/s to 107 counts/s. 1 to 7 decades (1 : 107) of continuous display.
Measurement speed	650 measurements per second.
Ion Source	Electron bombardment type, radially symmetric. Low-profile.
Filament	Two individual side-mounting filaments. Oxide coated iridium standard.
Electron emission	Software variable 1µA to 2 mA
Electron energy	Software variable 4 to 150 eV
Ion energy	Software variable 0 to 10 eV
Probe axis potential	Software variable -100 eV to +100 eV
Analyser mounting flange	DN-100-CF (6″/150 mm OD Conflat-type) base flange. 9 mm rod diameter systems include an adaptor housing for mounting to a DN-63-CF (4.5”/114 mm OD conflat type).
Analyser insertion length from base flange face	411 mm from DN-100-CF base flange 196 mm from 9 mm pole diameter systems DN-63-CF adapter housing flange.
RC7 Control interface unit	Height: 315 mm/7U Width: 19″ rack mounting Depth: 450 mm
RF head amp dimensions	Free-standing module 345 mm x 160 mm x 125 mm
RF generator dimensions	Free-standing module 437 mm x 272 mm x 270 mm with 0.9m RF cables to the analyser head
Cable lengths
RC interface to RF head	3 m standard. Longer lengths to 30 m available
RC interface to PC	Up to 15 metres with RS232 link. Up to 750 metres with unbridged Ethernet link. 5 m Ethernet and 5 m RS232 cables included.
Power requirement	110-120 VAC, 220-240 VAC, 0.25 kVA.

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