Plasma Engineering – Reeco https://demo9.thuythu.vn/reeco Thu, 25 Jan 2024 07:41:08 +0000 en-GB hourly 1 https://wordpress.org/?v=6.4.2 https://demo9.thuythu.vn/reeco/wp-content/uploads/2024/02/cropped-logo-nho-reeco-32x32.png Plasma Engineering – Reeco https://demo9.thuythu.vn/reeco 32 32 XBS https://demo9.thuythu.vn/reeco/en/san-pham/xbs/ https://demo9.thuythu.vn/reeco/en/san-pham/xbs/#respond Thu, 25 Jan 2024 07:41:08 +0000 https://demo9.thuythu.vn/reeco/?post_type=product&p=3432
  • Model: XBS
  • Manufacturer: Hiden Analytical
    • Molecular beam sources require accurate control for reproducible production quality thin film growth. Hiden’s XBS (cross beam source) system provides in-situ monitoring of multiple sources with real-time signal output for precise control of the deposition. Hiden’s XBS is a great tool used in molecular beam mass spectrometry. Applications
    • MBE monitoring and control
    • Molecular beam studies
    • Multiple beam source analysis
    • High performance RGA
    • Desorption
    • Outgassing studies
    • Bakeout cycles
    • Process gas contaminents
    ]]>
  • Model: XBS
  • Manufacturer: Hiden Analytical
    • Molecular beam sources require accurate control for reproducible production quality thin film growth. Hiden’s XBS (cross beam source) system provides in-situ monitoring of multiple sources with real-time signal output for precise control of the deposition. Hiden’s XBS is a great tool used in molecular beam mass spectrometry. Applications
    • MBE monitoring and control
    • Molecular beam studies
    • Multiple beam source analysis
    • High performance RGA
    • Desorption
    • Outgassing studies
    • Bakeout cycles
    • Process gas contaminents
    ]]>     https://demo9.thuythu.vn/reeco/en/san-pham/xbs/feed/ 0     IMP-EPD https://demo9.thuythu.vn/reeco/en/san-pham/imp-epd/ https://demo9.thuythu.vn/reeco/en/san-pham/imp-epd/#respond Thu, 25 Jan 2024 07:25:17 +0000 https://demo9.thuythu.vn/reeco/?post_type=product&p=3429
  • Model: IMP-EPD
  • Manufacturer: Hiden Analytical

    • Mass spectrometers for ion beam etching applications

    The HAL IMP-EPD ion milling probe end point detectors can be configured for manual or automatic end point detection. The IMP-EPD systms are quadrupole mass spectrometers with ion optics and integral energy filter for direct analysis of secondary ions from the etch process. The secondary ions provide precise information about the wafer surface layer composition in real time through the etch process.. Applications
    • End point analysis
    • Target impurity determination
    • Quality control/SPC
    • Residual gas analysis
    • Leak detection
    ]]>
  • Model: IMP-EPD
  • Manufacturer: Hiden Analytical

    • Mass spectrometers for ion beam etching applications

    The HAL IMP-EPD ion milling probe end point detectors can be configured for manual or automatic end point detection. The IMP-EPD systms are quadrupole mass spectrometers with ion optics and integral energy filter for direct analysis of secondary ions from the etch process. The secondary ions provide precise information about the wafer surface layer composition in real time through the etch process.. Applications
    • End point analysis
    • Target impurity determination
    • Quality control/SPC
    • Residual gas analysis
    • Leak detection
    ]]>     https://demo9.thuythu.vn/reeco/en/san-pham/imp-epd/feed/ 0     PSM https://demo9.thuythu.vn/reeco/en/san-pham/psm/ https://demo9.thuythu.vn/reeco/en/san-pham/psm/#respond Thu, 25 Jan 2024 07:05:05 +0000 https://demo9.thuythu.vn/reeco/?post_type=product&p=3425
  • Model: PSM
  • Manufacturer: Hiden Analytical
    • The Hiden PSM plasma ion analyser is a quadrupole mass spectrometer designed for direct analysis of plasma ions and neutrals in both plasma characterisation and process diagnostic applications. Applications
    • Plasma Characterisation
    • Plasma Etching and ALE
    • HiPIMS
    • Diamond-Like Carbon (DLC) Coating
    • Pulsed Laser Deposition (PLD) Coatings
    • DC Magnetron Deposition of SiBCN Films
    ]]>
  • Model: PSM
  • Manufacturer: Hiden Analytical
    • The Hiden PSM plasma ion analyser is a quadrupole mass spectrometer designed for direct analysis of plasma ions and neutrals in both plasma characterisation and process diagnostic applications. Applications
    • Plasma Characterisation
    • Plasma Etching and ALE
    • HiPIMS
    • Diamond-Like Carbon (DLC) Coating
    • Pulsed Laser Deposition (PLD) Coatings
    • DC Magnetron Deposition of SiBCN Films
    ]]>     https://demo9.thuythu.vn/reeco/en/san-pham/psm/feed/ 0     ESPion https://demo9.thuythu.vn/reeco/en/san-pham/espion/ https://demo9.thuythu.vn/reeco/en/san-pham/espion/#respond Tue, 23 Jan 2024 06:42:39 +0000 https://demo9.thuythu.vn/reeco/?post_type=product&p=3243
  • Model: ESPion
  • Manufacturer: Hiden Analytica
    • The Hiden ESPION system provides automatic real-time acquisition of plasma parameters delivering detailed information for use in plasma characterisation and uniformity monitoring including:
    • PlasmaPotential
    • Electron Temperature
    • IonDensity
    • ElectronDensity
    • IonFlux
    Electron Energy Distribution Function (EEDF) Applications
    • Plasma Characterisation
    • Plasma Etching and ALE
    • HiPIMS
    • Diamond-Like Carbon (DLC) Coating
    • Pulsed Laser Deposition (PLD) Coatings
    • DC Magnetron Deposition of SiBCN Films
    ]]>
  • Model: ESPion
  • Manufacturer: Hiden Analytica
    • The Hiden ESPION system provides automatic real-time acquisition of plasma parameters delivering detailed information for use in plasma characterisation and uniformity monitoring including:
    • PlasmaPotential
    • Electron Temperature
    • IonDensity
    • ElectronDensity
    • IonFlux
    Electron Energy Distribution Function (EEDF) Applications
    • Plasma Characterisation
    • Plasma Etching and ALE
    • HiPIMS
    • Diamond-Like Carbon (DLC) Coating
    • Pulsed Laser Deposition (PLD) Coatings
    • DC Magnetron Deposition of SiBCN Films
    ]]>     https://demo9.thuythu.vn/reeco/en/san-pham/espion/feed/ 0